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Diode lasers operating at 3 mu m in continuous wave mode at room temperature were fabricated using metamorphic molecular beam epitaxy. The laser heterostructures have a lattice constant 1.3-1.6% bigger than that of the GaSb substrates. The mismatch between the epi-structure and the substrate lattice constants was accommodated by a network of misfit dislocations confined within linearly compositionally graded buffer layers. Two types of the buffers were tested-GaInSb and AlGaInSb. The laser heterostructures with Al-containing buffer layers demonstrated better surface morphology and produced devices with lower threshold and higher efficiency. At the same time the use of Al-containing buffers caused an excessive voltage drop across the laser heterostructure. Thus, a maximum continuous wave output power of 200 mW was obtained from lasers grown on GaInSb buffers, while only 170 mW was obtained from those grown on AlGaInSb buffers. REPORT DOCUMENTATION PAGE (SF298) (Continuation Sheet) Continuation for Block 13